Senior Project Advisor
Fe films, Sputtering Magnetron
The temperature dependence of the electrical resistance for Fe films with thicknesses of 20-400 nm has been investigated. The films were prepared by DC magnetron sputtering onto SiO2 substrates. The investigation was prompted by the purchase of new lab equipment by Western Washington University and the necessity to test their basic functionality. The film thicknesses were characterized by x-ray diffraction for films up to about 200 nm. Temperature effects were observed by using a closed-cycle refrigerator. An anomalous dip in resistance was detected around 40-50 K for all samples. The resistivity of these films was also calculated and compared to published values as well as a bulk 1 mm thick sample of the target material used in the sputtering.
Wolf, Cedar S., "Characterization of Sputtered Fe Thin Films" (2006). WWU Honors Program Senior Projects. 344.
Subjects - Topical (LCSH)
Ferroelectric thin films
student projects; term papers
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