Senior Project Advisor

From, Milton

Document Type

Project

Publication Date

Spring 2006

Keywords

Fe films, Sputtering Magnetron

Abstract

The temperature dependence of the electrical resistance for Fe films with thicknesses of 20-400 nm has been investigated. The films were prepared by DC magnetron sputtering onto SiO2 substrates. The investigation was prompted by the purchase of new lab equipment by Western Washington University and the necessity to test their basic functionality. The film thicknesses were characterized by x-ray diffraction for films up to about 200 nm. Temperature effects were observed by using a closed-cycle refrigerator. An anomalous dip in resistance was detected around 40-50 K for all samples. The resistivity of these films was also calculated and compared to published values as well as a bulk 1 mm thick sample of the target material used in the sputtering.

Department

Physics/Astronomy

Subjects - Topical (LCSH)

Ferroelectric thin films

Genre/Form

student projects; term papers

Type

Text

Rights

Copying of this document in whole or in part is allowable only for scholarly purposes. It is understood, however, that any copying or publication of this document for commercial purposes, or for financial gain, shall not be allowed without the author’s written permission.

Rights Statement

http://rightsstatements.org/vocab/InC/1.0/

Language

English

Format

application/pdf

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Included in

Physics Commons

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